The 800 nm plate beamsplitter is a high-performance optical component specifically designed for Ti:sapphire femtosecond laser systems. Owing to their wide tunability (700–1000 nm) and ultrashort pulse duration (down to <20 fs), Ti:sapphire lasers are widely used in ultrafast spectroscopy, nonlinear microscopy, and precision micromachining. The 800 nm plate beamsplitter serves as a core element for stable beam routing and energy distribution within such systems.

· Dielectric Coating Design
Utilizing dielectric multilayer coatings, the beamsplitter provides customizable reflection/transmission ratios (R:T adjustable from 95:5 to 50:50 at 800 nm), while maintaining >90% transmission outside the target band to maximize energy utilization in the laser system.
· Ultra-Low Group Delay Dispersion
With carefully controlled group delay dispersion (GDD < 10 fs²), the beamsplitter preserves femtosecond pulse widths below 30 fs before and after reflection, maintaining pulse integrity and phase information—critical for experiments requiring high temporal resolution.
· High Laser Damage Threshold
Fabricated from high-purity UV-fused silica substrates and optimized coating materials, the beamsplitter achieves a laser-induced damage threshold (LIDT) > 3 J/cm² (10 ns single pulse @ 800 nm). This ensures long-term stable operation under high repetition rates and high average powers, without concerns of coating fatigue or ablation.
· Excellent Environmental Stability
With a surface flatness of λ/10 (@633 nm) and total scattering loss < 50 ppm, the beamsplitter delivers superior optical quality. It performs reliably under laboratory conditions of 15 °C–30 °C and 30%–60% relative humidity.
· Applications
Broadly used in Ti:sapphire femtosecond laser systems for intracavity beam routing, ultrafast pump–probe experiments, spectroscopic measurements, three-photon microscopy, and precision material micromachining.

Combining outstanding optical performance with exceptional reliability, the 800 nm plate beamsplitter is the ideal choice for engineers seeking ultimate performance and precise control in Ti:sapphire femtosecond laser systems.

Notes:For optimal performance, store and use at 25 °C and 40%–60% relative humidity. If contamination occurs on the coated surface, gently clean with >99% isopropyl alcohol and lint-free lens tissue. Avoid using rough fabrics, water, or abrasive cleaners, as these may damage the coatings.