Coad | 663563 | Typical Applications | ||
Type | Damage-Resistant 800nm Femtosecond Mirror | Clear Aperture | ||
Substrate | UVFS | Parallelism | ||
Diameter(mm) | 25.40 | Surface Quality S1 | ||
Diameter Tolerance | +0/-0.1mm | Surface Quality S2 | ||
Thickness(mm) | 6.35 | Surface Flatness | ||
Thickness Tolerance | +0/-0.1mm | Laser Damage Threshold | ||
Wavelength(nm) | 740 - 860 | GDD | ||
AOI(°) | 45 | Coating Type | IBS | |
Coating Specifications | S1:HR@740-860nm / |
Ultrafast Mirror, specifically designed for Ti:sapphire laser systems, thoroughly addresses the three main concerns that matter most to you: Are standard mirrors suitable for femtosecond laser systems? Can they fully preserve the temporal characteristics of ultrashort pulses? Can they withstand high peak intensities? With our ultrafast mirrors, you can be assured that these issues are no longer a concern in femtosecond and picosecond laser systems.
This series of mirrors is optimized for the typical operating wavelengths of Ti:sapphire lasers (780 nm–820 nm) and features a precision design using Ion Beam Sputtering (IBS) technology. Within the design wavelength range, the reflectivity can reach >99.8%, while Group Delay Dispersion (GDD) is strictly controlled to <10 fs², achieving almost zero temporal broadening for pulses as short as 30 fs before and after reflection, perfectly preserving pulse shape and phase information.
At the same time, IBS coatings have exceptionally high density and excellent adhesion, effectively resisting spectral shifts caused by changes in temperature, humidity, and vacuum conditions, ensuring long-term stable operation even in high humidity, high temperature, and vacuum environments. Combined with a high-purity fused silica substrate and low absorption loss coating, the Laser Induced Damage Threshold (LIDT) of this series of mirrors can reach >3 J/cm² (10 ns single pulse @800 nm), easily handling the extremely high peak energy demands of Ti:sapphire laser systems.
With the comprehensive advantages of high reflectivity, low absorption, low dispersion, and high damage threshold, this ultrafast Ti:sapphire laser line mirror is not only ideal for research-grade ultrafast spectroscopy, chirped pulse amplification (CPA) systems, and three-photon microscopy, but also widely applicable in industrial ultrafast processing and precision marking, providing the most reliable optical support for your femtosecond laser applications.
Precautions: To ensure optimal performance, it is recommended to store and use the mirror in an environment at 25°C with a relative humidity of 40%–60%. If the mirror surface becomes contaminated, gently wipe it with 99% or higher alcohol and a lint-free lens cleaning tissue. Avoid using rough fabrics, water, or cleaning agents containing abrasive particles, as they may damage the coating.
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